Приказ основних података о документу

dc.creatorMentus, S.
dc.creatorKrstic, I.
dc.creatorTešić, Živoslav Lj.
dc.creatorMontone, A.
dc.date.accessioned2018-11-22T00:09:51Z
dc.date.available2018-11-22T00:09:51Z
dc.date.issued2006
dc.identifier.issn0255-5476
dc.identifier.urihttp://cherry.chem.bg.ac.rs/handle/123456789/789
dc.description.abstractPotentiodynamic polarization of a mechanically polished titanium electrode in a diluted solution of Rhodium(III) chloride in 0.1 M perchloric acid was performed, resulting in simultaneous formation of both Rh and TiO2 films. The morphology of obtained Rh-dTiO(2) composite film followed the morphology of titanium support, as evidenced by SEM technique. This composite surface was examined by cyclic voltammetry in both acidic and alkaline solutions, in the potential region of both hydrogen and oxygen underpotential deposition. The charge related to hydrogen underpotential deposition corresponded to a surface roughness of 43. As a consequence of high surface roughness, the diffusion current of oxygen reduction in an oxygen saturated 0.1 M NaOH solution, measured by voltarnmetry on rotating disc electrode, was found to be comparable to the current of hydrogen underpotential deposition.en
dc.publisherTrans Tech Publications Ltd, Zurich-Uetikon
dc.rightsrestrictedAccess
dc.sourceMaterials Science Forum
dc.subjectelectrocatalysisen
dc.subjecthydrogen underpotential depositionen
dc.subjectoxygen reduction reactionen
dc.subjectRh/TiO2 composite layeren
dc.subjectrhodium electrodepositionen
dc.titleElectrochemical behaviour of a composite Rh/TiO2 layer formed potentiodynamically on titanium surfaceen
dc.typearticle
dc.rights.licenseARR
dcterms.abstractТешић, Живослав Љ.; Монтоне, A.; Крстиц, И.; Ментус, С.;
dc.citation.volume518
dc.citation.spage265
dc.citation.epage270
dc.identifier.wos000239351800044
dc.identifier.doi10.4028/www.scientific.net/MSF.518.265
dc.citation.other518: 265-270
dc.identifier.rcubKon_1742


Документи

ДатотекеВеличинаФорматПреглед

Нема фајлова за овај рад.

Овај рад се појављује у следећим колекцијама

Приказ основних података о документу